Table 2. Temperature change of the plate surface under different intense pulsed light treatment condition (unit: °C)
| Treatment condition | Minimum temp. | Maximum temp. | △T |
| Voltage (V) | 700 | 19.90±0.281)a | 20.10±0.14ab | 0.20b |
| 800 | 19.85±0.07a | 20.30±0.14a | 0.45ab |
| 900 | 18.65±0.35b | 19.15±0.35a | 0.50ab |
| 1,000 | 18.65±0.21b | 19.5±0.57ab | 0.85a |
| Distance (cm) | 4 | 18.65±0.21b | 19.5±0.57b | 0.85b |
| 8 | 20.40±0.28a | 20.80±0.28b | 0.40b |
| 12 | 20.65±0.49a | 20.95±0.49b | 0.30b |
Other treatment condition: Simmer current 0.2 A, Frequency 5 Hz, Pulse width 20 μs.
Mean±SD.
Means with different superscript letters within the same column are significantly different at p<0.05 by Duncan’s multiple range test.